A. Sonnenfeld, T. M. Tun, L. Zajíčková, K. V. Kozlov, H. Wagner, J. Behnke, R. Hippler
{"title":"常压下介质阻挡放电中基于有机硅前驱体的沉积过程——比较","authors":"A. Sonnenfeld, T. M. Tun, L. Zajíčková, K. V. Kozlov, H. Wagner, J. Behnke, R. Hippler","doi":"10.1023/A:1014414016164","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"115 1","pages":"237-266"},"PeriodicalIF":0.0000,"publicationDate":"2001-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"122","resultStr":"{\"title\":\"Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure—A Comparison\",\"authors\":\"A. Sonnenfeld, T. M. Tun, L. Zajíčková, K. V. Kozlov, H. Wagner, J. Behnke, R. Hippler\",\"doi\":\"10.1023/A:1014414016164\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":20249,\"journal\":{\"name\":\"Plasmas and Polymers\",\"volume\":\"115 1\",\"pages\":\"237-266\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"122\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Plasmas and Polymers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1023/A:1014414016164\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasmas and Polymers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1023/A:1014414016164","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}