低压合成器开关开关动力学研究

С.О. Слипченко, О С Соболева, А.А. Подоскин, Ю.К. Кириченко, Т. А. Багаев, И. В. Яроцкая, Н.А. Пихтин
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引用次数: 0

摘要

采用数值模拟方法研究了一系列低压InP同晶闸管异质结构设计。在n-p-n晶体管的p基区形成空间电荷层的设计被认为是基极设计。研究了决定电导跃迁速率的动态特性和过程。结果表明,当p基厚度从1 μm增加到2.6 μm时,最大导通电流从70 A增加到90 A,在最大阻断电压为55 V时,最小导通过渡时间为11 ns。结果表明,导通状态下的工作效率是由剩余电压决定的。残余电压随p基厚度的减小而减小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Исследование динамики включения низковольтных InP-гомотиристоров
A series of heterostructure designs of low-voltage InP homothyristors have been investigated using numerical simulation methods. The design with a space charge layer formed in the p-base region of the n-p-n transistor part was considered as the base one. The dynamic characteristics and processes that determine the rate of transition to the on state are investigated. It is shown that as the p-base thickness increases from 1 to 2.6 μm, the maximum on-state currents increase from 70 to 90 A, while the minimum turn-on transition time is 11 ns at a maximum blocking voltage of 55 V. It is shown that the operation efficiency in the on state is determined by the residual voltage. Residual voltage decreases with a decrease in the thickness of the p-base.
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