采用CNTD工艺制造的高温结构陶瓷材料

J.J. Stiglich Jr., D.G. Bhat, R.A. Holzl
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引用次数: 9

摘要

受控成核热化学沉积(CNTD)是在经典化学沉积(CVD)技术的基础上发展起来的。本文介绍了热化学晶粒细化技术。概述了这种细化对材料在室温和高温下力学性能的影响。重点介绍了SiC、Si3N4、AiN、TiB2和ZrB2等高温结构陶瓷材料。晶粒细化伴随力学性能改善的一个例子是SiC。在室温MOR为1380 ~ 2070 MPa (4 pt弯曲),1350℃时MOR为3450 ~ 4140 MPa (4 pt弯曲)的CNTD SiC中观察到500 ~ 1000 Å晶粒尺寸。介绍了这些材料在解决高温结构问题方面的各种应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High temperature structural ceramic materials manufactured by the CNTD process

Controlled Nucleation Thermochemical Deposition (CNTD) has emerged from classical chemical deposition (CVD) technology. This paper describes the techniques of thermochemical grain refinement. The effects of such refinement on mechanical properties of materials at room temperature and at elevated temperatures are outlined. Emphasis is given to high temperature structural ceramic materials such as SiC, Si3N4, AiN, and TiB2 and ZrB2. An example of grain refinement accompanied by improvements in mechanical properties is SiC. Grain sizes of 500 to 1000 Å have been observed in CNTD SiC with room temperature MOR of 1380 to 2070 MPa (4 pt bending) and MOR of 3450 to 4140 MPa (4 pt bending) at 1350°C. Various applications of these materials to the solution of high temperature structural problems are described.

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