И.В. Илькив, В.В. Лендяшова, Б.Б. Бородин, В.Г. Талалаев, Т. Шугабаев, Р.Р. Резник, Г. Э. Цырлин
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引用次数: 0

摘要

给出了用分子束外延研究硅表面InAs岛形成的实验结果。研究发现,由于Si表面起伏和纳米粒子的存在,可以形成具有双峰和均匀尺寸分布的InAs岛。结果表明,在1.65 μm范围内,用InAs量子点制备具有光致发光的异质结构是可行的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Формирование наноостровков InAs на поверхности кремния и гетероструктур на их основе
Experimental results of studying the InAs islands formation of silicon surface by molecular beam epitaxy are presented. It has been found that, InAs islands with both bimodal and uniform size distributions can be formed depending on the Si surface relief and the presence of nanopits. The possibility of fabricating heterostructures with InAs quantum dots demonstrating photoluminescence in the region of 1.65 μm, was showed.
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