CdTe:Ge在1.06和1.32 μm处的光折射率

K. Shcherbin, S. Oaouiov, P. Poplavko
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引用次数: 0

摘要

CdTe作为近红外实时全息记录的有前途的材料被广泛研究,因为与其他光折变半导体相比,它保证了最大的增益因子。在本报告中,我们介绍了在不同的乌克兰实验室中生长的光折变锗掺杂CdTe晶体的表征结果,并将结果与已知的钒掺杂CdTe[1]进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photorefractivity of CdTe:Ge at 1.06 and 1.32 μm
CdTe is studied intensively as promising material for the real time holographic recording in the near infrared because it ensures the largest gain factor as compared to the other photorefractive semiconductors. In this report we present the results of characterisation of photorefractive germanium doped CdTe crystals grown in different Ukrainian laboratories and compere the results with that known for vanadium doped CdTe [1].
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