从室温到亚开尔文温度,硅在禁带附近的光电吸收截面

Chris Stanford, M. J. Wilson, B. Cabrera, M. Diamond, N. Kurinsky, R. Moffatt, F. Ponce, B. Krosigk, B. Young
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引用次数: 1

摘要

使用低温硅作为暗物质搜索的探测介质正越来越受欢迎。许多这样的搜索高度依赖于硅在低温下的光电吸收截面值,特别是在硅带隙能量附近,在那里搜索对低质量暗物质候选者最敏感。虽然文献中缺乏这样的横截面数据,但以前的暗物质搜索实验试图通过从更高温度的数据推断来估计这个参数。然而,高温数据的差异导致了外推的数量级差异。在本文中,我们通过使用一种新技术来解决这些差异,该技术可以直接、低温地测量硅在带隙附近能量处的光电吸收截面。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photoelectric absorption cross section of silicon near the bandgap from room temperature to sub-Kelvin temperature
The use of cryogenic silicon as a detector medium for dark matter searches is gaining popularity. Many of these searches are highly dependent on the value of the photoelectric absorption cross section of silicon at low temperatures, particularly near the silicon band gap energy, where the searches are most sensitive to low mass dark matter candidates. While such cross section data has been lacking from the literature, previous dark matter search experiments have attempted to estimate this parameter by extrapolating it from higher temperature data. However, discrepancies in the high temperature data have led to order-of-magnitude differences in the extrapolations. In this paper, we resolve these discrepancies by using a novel technique to make a direct, low temperature measurement of the photoelectric absorption cross section of silicon at energies near the band gap.
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