真空脱气无氧铜电极的真空击穿强度

S. Kobayashi, Y. Saito, Y. Nagai, Y. Yamamoto
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引用次数: 12

摘要

采用原位电极表面清洗系统,测量了满足ASTM-F-68 1级、3级和5级纯度规格的真空脱气无氧铜(VDOFC)电极的真空击穿强度。击穿实验表明,击穿场(击穿电压/间隙长度)取决于VDOFC电极的纯度。1级铜的初始击穿强度为1.96*10/sup 7/ V/m, 3级为1.89*10/sup 7/ V/m, 5级为1.85*10/sup 7/ V/m。经过500次细分后,这些数字提高到第1类的18.3*10/sup 7/ V/m,第3类的17.5*10/sup 7/ V/m,第5类的11.8*10/sup 7/ V/m。结果表明,只要对电极表面进行适当的清洗,电极中的气体含量是影响真空击穿强度的重要因素。>
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Vacuum breakdown strength of vacuum-degassed oxygen-free copper electrodes
Using an in situ electrode surface cleaning system, the vacuum breakdown strength of vacuum degassed oxygen free copper (VDOFC) electrodes satisfying ASTM-F-68 Class 1, 3, and 5 purity specifications was measured. Breakdown experiments reveal that the breakdown field (breakdown voltage/gap length) depends on the purity of the VDOFC electrodes. The initial breakdown strengths are 1.96*10/sup 7/ V/m for Class 1 copper, 1.89*10/sup 7/ V/m for Class 3, and 1.85*10/sup 7/ V/m for Class 5. After 500 breakdowns, these figures were improved to 18.3*10/sup 7/ V/m for Class 1, 17.5*10/sup 7/ V/m for Class 3, and 11.8*10/sup 7/ V/m for Class 5. It is concluded that the gas content in the electrodes is an important factor relating to the vacuum breakdown strength, provided the electrode surface is properly cleaned. >
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