{"title":"高电阻率Fe-M-O (M=Zr, Hf)薄膜的磁性能","authors":"Y. Hayakawa, K. Hirokawa, A. Makino","doi":"10.1109/TJMJ.1994.4565994","DOIUrl":null,"url":null,"abstract":"The magnetic properties of Fe-M-O (M=Zr, Hf≫ films with high electrical resistivity, prepared by the rf magnetron sputtering technique in an Ar+O<inf>2</inf> atmosphere, were investigated. In the as-deposited state, low coercivities (H<inf>c</inf>) in the range 30 to 100 A/m were obtained for Fe-Hf-O, and 160 to 240 A/m for Fe-Zr-O, in the composition range characterized by an O/M ratio of between 3 and 4. After annealing under optimum conditions in an external field of 160 kA/m, the results obtained for Fe<inf>54.9</inf>Hf<inf>11</inf>O<inf>34.1</inf> and Fe<inf>65.3</inf>Zr<inf>8.9</inf>O<inf>25.8</inf> included a saturation magnetization (B<inf>s</inf>) of 1.2 T, an H<inf>c</inf> of 64 A/m, and a ¿ at 100 MHz of 1600 for the former, and a B<inf>s</inf> of 1.3 T, H<inf>c</inf> of 73 A/m and ¿ at 100 MHz of 1000 for the latter. Further, the electrical resistivities of the films were much higher than those of known metallic soft magnetic films.","PeriodicalId":100647,"journal":{"name":"IEEE Translation Journal on Magnetics in Japan","volume":"64 1","pages":"286-290"},"PeriodicalIF":0.0000,"publicationDate":"1994-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Magnetic Properties of Fe-M-O (M=Zr, Hf) Films with High Resistivity\",\"authors\":\"Y. Hayakawa, K. Hirokawa, A. Makino\",\"doi\":\"10.1109/TJMJ.1994.4565994\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The magnetic properties of Fe-M-O (M=Zr, Hf≫ films with high electrical resistivity, prepared by the rf magnetron sputtering technique in an Ar+O<inf>2</inf> atmosphere, were investigated. In the as-deposited state, low coercivities (H<inf>c</inf>) in the range 30 to 100 A/m were obtained for Fe-Hf-O, and 160 to 240 A/m for Fe-Zr-O, in the composition range characterized by an O/M ratio of between 3 and 4. After annealing under optimum conditions in an external field of 160 kA/m, the results obtained for Fe<inf>54.9</inf>Hf<inf>11</inf>O<inf>34.1</inf> and Fe<inf>65.3</inf>Zr<inf>8.9</inf>O<inf>25.8</inf> included a saturation magnetization (B<inf>s</inf>) of 1.2 T, an H<inf>c</inf> of 64 A/m, and a ¿ at 100 MHz of 1600 for the former, and a B<inf>s</inf> of 1.3 T, H<inf>c</inf> of 73 A/m and ¿ at 100 MHz of 1000 for the latter. Further, the electrical resistivities of the films were much higher than those of known metallic soft magnetic films.\",\"PeriodicalId\":100647,\"journal\":{\"name\":\"IEEE Translation Journal on Magnetics in Japan\",\"volume\":\"64 1\",\"pages\":\"286-290\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1994-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Translation Journal on Magnetics in Japan\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/TJMJ.1994.4565994\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Translation Journal on Magnetics in Japan","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/TJMJ.1994.4565994","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Magnetic Properties of Fe-M-O (M=Zr, Hf) Films with High Resistivity
The magnetic properties of Fe-M-O (M=Zr, Hf≫ films with high electrical resistivity, prepared by the rf magnetron sputtering technique in an Ar+O2 atmosphere, were investigated. In the as-deposited state, low coercivities (Hc) in the range 30 to 100 A/m were obtained for Fe-Hf-O, and 160 to 240 A/m for Fe-Zr-O, in the composition range characterized by an O/M ratio of between 3 and 4. After annealing under optimum conditions in an external field of 160 kA/m, the results obtained for Fe54.9Hf11O34.1 and Fe65.3Zr8.9O25.8 included a saturation magnetization (Bs) of 1.2 T, an Hc of 64 A/m, and a ¿ at 100 MHz of 1600 for the former, and a Bs of 1.3 T, Hc of 73 A/m and ¿ at 100 MHz of 1000 for the latter. Further, the electrical resistivities of the films were much higher than those of known metallic soft magnetic films.
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