温度对重复脉冲电压下不同上升时间搪瓷双绞线RPDIV的影响

Yuki Zenda, S. Takenouchi, M. Kozako, M. Hikita, T. Okamoto, Sun Jintong, A. Izumi, K. Karasawa
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引用次数: 0

摘要

逆变电机定子绕组电容的增加增加了重复脉冲电压的上升时间。有报道称,绕组的局部放电起始电压(PDIV)随着上升时间的增加而降低。本文模拟变频电机绕组在重复冲击电压和高温环境下的绝缘系统,研究了上升时间对搪瓷双绞线试样PDIV的影响。采用直径10 mm带高通滤波器(395~3200 MHz)的环形天线传感器(LS)检测PD,采用自动PD测量系统测量重复PDIV (RPDIV)。双绞线样品的RPDIV随冲击电压波形上升时间tr变化的温度依赖性。结果表明,在室温下,RPDIV几乎与tr无关,而在100℃以上的高温区域,RPDIV随温度和tr的升高而显著降低。RPDIV随温度升高而降低可以解释为双绞线样品形成的楔形间隙处气体密度随温度升高而降低。此外,在高温区域,RPDIV随着tr的增加而显著降低。这一结果被认为是由于初始电子供应触发放电的概率随着tr的增加而增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of Temperature on RPDIV of Enamel Twisted Pair under Repetitive Impulse Voltage Application with Different Rise Time
An increase in the capacitance of the stator winding of an inverter-fed motor increases the rise time of repetitive impulse voltage. It has been reported that partial discharge inception voltage (PDIV) of the windings decreases as the rise time increases. This paper deals with the effect of the rise time on PDIV of enamel twisted pair samples simulating the insulation system of the windings of inverter-fed motors under repetitive impulse voltage and high temperature environment. PDs were detected by a 10 mm diameter loop antenna sensor (LS) with a high-pass filter (395~3200 MHz), and repetitive PDIV (RPDIV) was measured using an automatic PD measurement system. Temperature dependence of RPDIV of the twisted pair sample with varying the rise time tr of the impulse voltage waveform. It was found that RPDIV at room temperature is almost the same regardless of tr, while in the high temperature region above 100 °C RPDIV decreases remarkably with increasing temperature and tr. The decrease in RPDIV with temperature rise can be interpreted in terms of the decrease in gas density with the temperature increase at the wedge-shaped gap formed by the twisted pair sample. In addition, a significant decrease in RPDIV was found to appear with increase in tr in the high temperature region. The result is considered to be caused by increase in the probability of initial electron supply for triggering discharge with increase in tr.
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