双蜗壳离心泵分流叶片叶轮压力波动的缓解

IF 1 4区 工程技术 Q3 ENGINEERING, MULTIDISCIPLINARY
C. Kang, S. Teng, J. Hu, Kejin Ding, Wenbin Zhang
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引用次数: 1

摘要

摘要本研究旨在解释叶轮结构对双蜗壳离心泵性能的影响。提出了5个长叶片和10个分流叶片的叶轮。通过实验,比较了单独安装该叶轮的泵与常规叶轮的性能。捕获了不同流量下压力沿流方向的波动分布。通过在底板上布置监测点来测量泵的振动。在分流叶片的参与下,叶片通过频率的谐波仍然占主导地位,但相应的压力波动被抑制。从分流板到泵出口处特征频率衰减,这在新型叶轮方案中更为显著。均方根压力波动幅值在设计流量时达到最小,且两种叶轮方案的均方根压力波动幅值共享。带分流叶片的叶轮具有较低的均方根压力波动幅值。采用所设计的叶轮,减轻了泵的振动。与传统叶轮方案相比,与特征频率相关的振动加速度减小了。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mitigation of pressure fluctuation through an impeller with splitter blades for a double-volute centrifugal pump
ABSTRACT The present study aims to explain the effect of impeller structure on performance of a double-volute centrifugal pump. The impeller with 5 long blades and 10 splitter blades was proposed. An experimental work was performed to compare performance between the pumps equipped separately with the proposed and the conventional impellers. Distribution of pressure fluctuations in streamwise direction was captured at different flow rates. Vibration of the pump was measured through deploying monitoring points on the base plate. With participation of the splitter blades, harmonics of the blade passing frequency remain dominant but corresponding pressure fluctuation is suppressed. Characteristic frequencies attenuate from the division plate to the pump outlet, which is more remarkable for the new impeller scheme. The root mean square (RMS) pressure fluctuation amplitude arrives at its minimum at the design flow rate, which is shared by the two impeller schemes. The impeller with splitter blades is responsible for lower RMS pressure fluctuation amplitude. Vibration of the pump is alleviated with the proposed impeller. Vibration acceleration associated with the characteristic frequencies is reduced relative to that of the conventional impeller scheme.
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来源期刊
Journal of the Chinese Institute of Engineers
Journal of the Chinese Institute of Engineers 工程技术-工程:综合
CiteScore
2.30
自引率
9.10%
发文量
57
审稿时长
6.8 months
期刊介绍: Encompassing a wide range of engineering disciplines and industrial applications, JCIE includes the following topics: 1.Chemical engineering 2.Civil engineering 3.Computer engineering 4.Electrical engineering 5.Electronics 6.Mechanical engineering and fields related to the above.
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