Н.В. Востоков, М. Н. Дроздов, С.А. Краев, О И Хрыкин, П.А. Юнин
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Влияние термического отжига на транспортные свойства низкобарьерных диодов Мотта Ti/AlGaN/GaN
The influence of thermal annealing on the transport properties of Ti/AlGaN/GaN low-barrier Mott diodes with near-surface polarization-induced δ-doping has been studied. It is shown that annealing provides additional possibilities for controlling the effective barrier height of diodes, improving and fine-tuning their transport characteristics. Thermal annealing can be used to fabricate low-barrier diodes designed to operate at high temperatures.
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