硼或氮取代掺杂单层石墨烯的电子输运性质建模与研究

L. Chandrasekar, K. P. Pradhan
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引用次数: 0

摘要

对硼(B)或氮(N)取代掺杂单层石墨烯的关键电子性质-相互作用参数$(r_{s})$进行了解析建模。此外,相互作用参数为探索散射时间$(\tau)$、电导率$(\sigma)$和迁移率$(\mu)$等重要传输特性铺平了道路,这些特性在本研究中已经被研究过了。未掺杂的原始单层石墨烯的相互作用参数是恒定的,与载流子密度无关,仅取决于衬底材料的介电常数。另一方面,B/N取代掺杂石墨烯的相互作用参数受到Dirac点位移、掺杂剂和载流子密度引起的非零带隙的广泛影响。从输运性质可以预测,B/N取代掺杂石墨烯在电子和空穴中都表现出明显的不对称电子输运行为,而在原始石墨烯中则是对称的。因此,石墨烯中的取代掺杂抑制了双极性特性,并大大提高了ON/OFF比。此外,电子和输运性质是建模低维器件时所关心的基本量。因此,对B/N取代掺杂石墨烯的电子输运性质的研究为掺杂石墨烯在场效应器件应用中的器件建模提供了更多的见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Modeling and Investigation of Electronic Transport Properties of Boron or Nitrogen Substitution Doped Single Layer Graphene
The key electronic property - interaction parameter $(r_{s})$ for boron (B) or nitrogen (N) substitution doped single layer graphene is analytically modeled. Further, the interaction parameter paves a route to explore the vital transport properties such as scattering time $(\tau)$, conductivity $(\sigma)$, and mobility $(\mu)$, which have been investigated for B/N substitution doped graphene in this work. The interaction parameter for undoped pristine single layer graphene is constant and independent of carrier density and depends only on the dielectric constant of the substrate material. On the other hand, the interaction parameter for B/N substitution doped graphene is extensively influenced by shifting of Dirac point, non-zero bandgap due to dopant and carrier density. From the transport properties, it has been predicted that B/N substitution doped graphene exhibits significant asymmetric electronic transport behaviour in both electrons and holes rather symmetric in pristine graphene. Consequently, substitution doping in graphene suppresses ambipolar characteristics and highly leading to enhance the ON/OFF ratio. Also, the electronic and transport properties are the essential quantities of interest while modeling the low-dimensional devices. Therefore, investigation of electronic transport properties of B/N substitution doped graphene reveals more insights in the device modeling of doped graphene in field-effect device applications.
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