Y. Tang, X. Cheng, L. Tao, C. Suen, M. Talaat, R. Inglese
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VLSI architecture for parallel concentration-contour approach
A method called concentration-contour method is presented. It transforms a compound pattern into an integral one where contour analysis can be used. The concentration-contour method consists of four phases: (1) concentration of pattern, (2) extraction of contour, (3) transformation of numerical features, and (4) classification. The diagonal-diagonal regional projection transformation (DDRPT), which converts a compound pattern into an integral object, has been used. A VLSI architecture to implement the concentration-contour approach has been designed. The time complexity of the method is only O(N) compared with O(N/sup 2/) when a uniprocessor is used.<>
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