离子束辅助磁控溅射沉积制备DLC的研究

Kai Huang, Haibo Guo, Yigang Chen
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引用次数: 0

摘要

以乙炔为碳源,采用离子束磁控溅射法制备了含tic的DLC薄膜。薄膜的沉积速度是离子束沉积的3倍。合成的DLC膜的粗糙度最小为2.2 nm,硬度最高为11.97 GPa。利用红外光谱、XRD、拉曼光谱和原子力显微镜研究了离子束电压和沉积温度对材料组成、微观结构和表面状态的影响。分析了纳米压痕实验中DLC薄膜的力学性能,分析了H、TiC和sp键含量的变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study of DLC Formation with Ion-Beam Assisted Magnetron Sputtering Deposition
TiC-containing DLC films are deposited by magnetron sputtering by means of ion beam deposition using acetylene as carbon source. The deposition rate of the films is three times as fast as that by ion beam deposition alone. The minimum roughness is 2.2 nm and the highest hardness is 11.97 GPa for the synthesized DLC films. The effects of ion beam voltage and deposition temperature on the composition, microstructures, and surface states are studied using infrared spectroscopy, XRD, Raman spectroscopy, and AFM. Mechanical properties of the DLC films from nanoindentation tests are analyzed with the variation of H and TiC, as well as content of sp bonds.
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