四硫代钨酸铵热分解生长大面积均匀少层二硫化钨

O. A. Abbas, He Wang, A. Lewis, N. Sessions, N. Aspiotis, Chung-Che Huang, I. Zeimpekis, D. Hewak, S. Mailis, P. Sazio
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引用次数: 0

摘要

二维过渡金属二硫化物(2D-TMDCs),如二硫化钼(2D-M0S2)和二硫化钨(2D-WS2),由于其可调谐的物理和化学性质,现已被确立为一类纳米材料,可用于许多应用。然而,在电学特性和光致发光效率方面,WS2通常表现出优于钼类似物的性能[2,3]。然而,与更好的2D-MoS2生长方案相比,合成连续、均匀和厚度可控的2D-WS2薄膜用于(光电)电子器件制造更具挑战性。因此,寻找可替代的2D-WS2前驱体和合成方法,以提供低成本、高质量的批量生产是非常可取的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Growth of Large-Area, Uniform, Few-Layer Tungsten Disulphide by Thermal Decomposition of Ammonium Tetrathiotungstate
Two-dimensional transition metal dichalcogenides (2D-TMDCs) such as molybdenum disulphide (2D-M0S2) and tungsten disulphide (2D-WS2) are now established as a class of nanomaterials that can be used in numerous applications due to their tuneable physical and chemical properties [1]. However, in terms of electrical characteristics and photoluminescence efficiency, WS2 typically exhibits superior performance compared with the molybdenum analogue [2,3]. Nevertheless, synthesis of continuous, uniform and thickness controllable 2D-WS2 films for (opto)electronic device fabrication is more challenging compared with better established 2D-MoS2 growth protocols. Therefore, the search for alternative precursors and synthesis approaches of 2D-WS2 that can provide mass production with excellent quality at low cost is highly desirable [1].
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