低温下SOI衬底p沟道finfet饱和工作性能

H. Achour, B. Crețu, J. Routoure, R. Carin, A. Benfdila, E. Simoen, C. Claeys
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引用次数: 2

摘要

分析了低温工作对应变和非应变p沟道SOI finfet的短沟道效应和模拟性能的影响。研究了饱和工作模式下的主要电参数,并与室温下的电参数进行了比较。在10 K工作时的低频噪声测量表明,在中度反转中,载波数波动主导闪烁噪声,而在强反转中,接入电阻噪声占主导地位。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Performances under saturation operation of p-channel FinFETs on SOI substrates at cryogenic temperature
The impact of cryogenic temperature operation on the short channel effects and analog performances was analysed on strained and unstrained p-channel SOI FinFETs. The main electrical parameters extracted from the saturation mode of operation are investigated and compared to those found at room temperature. Low frequency noise measurements at 10 K operation show that the carrier number fluctuations dominate the flicker noise in moderate inversion, while the access resistance noise contributions prevail in strong inversion.
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