直流断弧中钯材料的接触侵蚀模式

Zhuan-Ke Chen, H. Mizukoshi, K. Sawa
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引用次数: 41

摘要

用扫描电镜(SEM)测定了纯钯触点在20 V、1.0/spl sim/4.0 A开关电感负载下的电弧侵蚀模式,并用电子天平测量了材料转移。在不同的负载电流区域观察到三种类型的侵蚀模式。首先,当电流小于约2.5 A时,阳极上出现了分布的弹坑,阴极上出现了分散的再沉积丘,周围是喷射颗粒,我们称之为临界过渡电流,因为它表明了金属转移方向的变化;其次,如果电流大于临界电流值,则在阳极上出现针孔,在阴极上出现凹坑;第三,当电流在临界电流值附近时,无论是在阴极上还是在阳极上,都存在点和坑。报道了不同负载电流下金属相和气相的接触电阻和电弧持续时间的变化。提出了颗粒溅射沉积模型,并用该模型解释了材料转移过程和侵蚀模式形成的机理。材料的传递方向受金属相电弧持续时间和气相电弧持续时间的影响。接触电阻不仅取决于表面膜层和表面形貌,还受颗粒溅射的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Contact erosion patterns of Pd material in DC breaking arcs
Arc erosion patterns of pure Pd contacts tested with switching inductive loads at 20 V, 1.0/spl sim/4.0 A were determined by means of SEM and material transfer was measured with an electronic balance. Three types of erosion patterns were observed at the different load current regions. Firstly, distributed craters occurred on the anode and scattered redeposited mounds surrounded by sprayed particles on the cathode when the current was less than about 2.5 A, which we called a critical transition current because it demonstrates the change of metal transfer direction; secondly, if the current was larger than the critical current value, pips occurred on the anode and craters on the cathode; thirdly, when the current was around the critical current value, both pips and craters co-existed either on the cathode or on the anode. The behaviours of electrical contact resistance and arc duration in the metallic phase and the gaseous phase at different load currents are reported. The particle sputtering-depositing model is presented and used to explain the mechanism of material transfer processes and the formation of erosion patterns. The material transfer direction is affected by the arc duration of the metallic phase as well as the gaseous phase. The electrical contact resistance not only depends on the surface films and surface morphology, but is also influenced by the particle sputtering.
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