Photoinduced Refractive Index Modulation of Photosensitive Polyimides and Their Application in Passive Waveguide Fabrication

Abstract A novel photosensitive poly(amide-co-imide) was synthesized from the copolymerization of p-phenylenediacryloyl chloride, bis(3,4-dicarboxyliphenyl)hexafluoropropane dianhydride and 4,4′-oxydipehnyldiamine followed by subsequent chemical imidization. The resulting polymer showed intrinsic photosensitivity without additives, good processability in solution and high thermal stability up to 350 °C. From the refractive index measurement of the polymer by prism coupling method, it was found that the refractive index could be varied precisely with respect to the exposure time (from 1.6444 to 1.6230 for 2 μm thick film, TE mode, measured at 1.55 μm). Fabrication of passive waveguide was attempted by the photo-patterning process, i.e., photo-modulation of refractive index. Straight waveguide was easily fabricated and single mode near-field pattern was observed by using 1.55 μm near-IR light.