基于Preisach模型的磁控溅射(Cr/NiO/Ni)多层镀层磁性能建模

A. Bendjerad
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引用次数: 4

摘要

本文采用射频磁控溅射技术在玻璃衬底上沉积了Cr/NiO/Ni薄膜。制备薄膜的均匀性和均匀性可通过改变源功率、靶基距离和等离子体气体(氩气)的压力来控制。为了测试Preisach模型,我们在室温下使用振动样品磁强计根据两个方向进行了测量:平行和垂直于衬底平面。将实验所得的磁滞回线与Preisach模型所得的磁滞回线进行了比较,得到了较好的一致性。我们得出结论,该模型在预测多层体系的磁性能方面是强有力的。# Cr/NiO/Ni #磁控溅射#PREISACH模型#磁滞
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Modeling of magnetic properties (Cr/NiO/Ni) based multi-layers deposited by magnetron sputtering using Preisach model
In the present work, thin films of Cr/NiO/Ni are deposited on glass substrates using RF magnetron sputteringtechnique. The uniformity and homogeneity of the prepared films were controlled by varying the power of the source, the target-substrate distance and the pressure of the plasma gas which is argon. In order to test the Preisach Model, we carried outmeasurements according to two directions: parallel and perpendicular to the substrate plane using a Vibrating SampleMagnetometer at room temperature. Good agreement has been obtained by comparing the experimental hysteresis loops to theones determined using Preisach model. We conclude that this model is powerful in predicting the magnetic properties ofmultilayer systems. # Cr/NiO/Ni #MAGNETRON_SPUTTERING #PREISACH MODEL #MAGNETIC_HYSTERESIS
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