氧化锌压敏电阻中势垒结构的晶体学控制

C Leach
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引用次数: 5

摘要

利用扫描电子显微镜(SEM)研究了氧化锌基压敏电阻器中各晶界的电学特性。尽管一些晶界显示出预期的“明暗”对比,与带电晶界两侧对称、相反的电场一致,但大多数界面是电不对称的,只显示出明暗对比。在这些情况下,需要在晶界施加几十毫伏的外部电压偏置以恢复对称势垒结构。利用电子背散射图(EBSP)分析确定晶界两侧晶粒的取向,并通过观察晶界EBIC对比峰随扫描电镜波束电压的横向位移计算晶界面取向,从而计算穿透深度。发现电性不对称性受界面两侧晶界面取向的支配,表明势垒结构具有一定的晶体学控制作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Crystallographic control of the barrier structure in zinc oxide varistors

Scanning electron microscope (SEM) based remote electron beam induced current (REBIC) microscopy has been used to investigate the electrical characteristics of individual grain boundaries in a zinc oxide based varistor. Although some grain boundaries showed the expected ‘bright and dark’ contrast consistent with symmetrical, opposed, electric fields on either side of a charged grain boundary, the majority of interfaces are electrically asymmetric showing only either bright or dark contrast. In these cases, the application of an external voltage bias to the grain boundary of several ten’s of millivolts is necessary to restore a symmetrical barrier structure. The orientations of grains on either side of each grain boundary were determined using electron backscattered pattern (EBSP) analysis and the grain boundary plane orientation was calculated by observing the lateral shift of the grain boundary EBIC contrast peak with SEM beam voltage and, hence, penetration depth. It was found that the electrical asymmetry is governed by the orientations of the grain boundary planes on either side of the interface, demonstrating some crystallographic control of the barrier structure.

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