基于PIC/MCC达尔文代码的大型多频ccp溅射源动力学仿真

D. Eremin, S. Bienholz, D. Szeremley, T. Hemke, P. Awakowicz, R. Brinkmann, T. Mussenbrock
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引用次数: 0

摘要

只提供摘要形式。基于CCP多频大尺度放电的新型溅射源概念目前正在实验研究中[1]。这种放电的物理学是相当复杂的,包括在几个时间和空间尺度上发生的现象。特别是,由于这种放电的尺寸和驱动电压中的高频谐波,电磁效应可能起重要作用。此外,使用电不对称效应(EAE)来产生自一致的偏置使问题更加复杂。在目前的工作中,我们报告了我们用最近开发的自一致动力学2d3c PIC/MCC gpu并行代码研究这种放电的结果,该代码使用达尔文近似[2]来描述电磁场分量。模拟是在接近实验中使用的溅射源的几何结构中进行的。讨论了主室和侧室放电的有趣特征,并将模拟结果与实验数据进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Kinetic simulations of a large-sized multifrequency CCP-based sputtering source with a PIC/MCC darwin code
Summary form only given. A novel concept of a sputtering source based on a CCP multifrequency large-sized discharge is currently under experimental investigation [1]. The physics of such a discharge is quite complex and includes phenomena taking place on several time and spatial scales. In particular, because of the size and the high frequency harmonics in the driving voltage of such a discharge, the electromagnetic effects may play a significant role. Moreover, use of the electrical asymmetry effect (EAE) to create a self-consistent bias complicates the problem even more. In the present work we report results of our studying such a discharge with a recently developed self-consistent kinetic 2d3c PIC/MCC GPU-parallelized code which uses Darwin approximation [2] for description of the electromagnetic field components. The simulations are made in a geometry close to that of the sputtering source used in the experiments. We discuss interesting features of the discharges arising in the main and the side chambers and compare the simulation results and the experimental data.
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