用原子探针层析成像技术定量分析多晶硅光电器件中的原子尺度缺陷

B. Gorman, H. Guthrey, M. Al‐Jassim
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引用次数: 2

摘要

表征缺陷位置及其对多晶硅光电传输的影响很容易通过光学和电学表征来完成。由于低浓度和高度局部化的位置,关于这些缺陷的元素性质的信息更加困难。这项工作证明了在聚焦离子束样品制备工具中使用相关电子显微镜和光谱学,然后使用3-D原子探针断层扫描,定位和元素分析这些器件中的电子缺陷的能力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Quantification of atomic scale defects in poly Si PV devices using atom probe tomography
Characterization of defect locations and their effects on transport in polycrystalline Si photovoltaics is readily accomplished using optical and electrical characterization. Information on the elemental nature of these defects is more difficult due to both the low concentrations and highly localized positions. This work demonstrates the ability to locate and elementally analyze electronic defects in these devices using correlative electron microscopy and spectroscopy within a focused ion beam specimen preparation tool followed by 3-D atom probe tomography.
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