在中能量电子照射下的玻璃表面加工

R. Khasanshin, L. Novikov
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摘要

本文介绍了太阳电池防护玻璃和高轨道人造地球卫星(AES)反射涂层元件表面在能量为30kev的电子照射下发生的过程的实验研究结果。所研究的样品是在K-208玻璃的基础上制成的,而反射涂层样品的不同之处在于在玻璃板的反表面存在银层和不锈钢层,并通过磁控溅射法依次沉积。样品在10-4 Pa真空中进行电子辐照,粒子通量密度(φ)为1·109 ~ 8·1012 cm-2s-1;用原子力显微镜(AFM)观察辐照前后样品的表面形貌。在辐照后的玻璃样品表面产生静电放电(ESD),其参数用所产生的电磁脉冲波形图表征;对于反射涂层元件,还测量了金属基板的泄漏电流。研究发现,样品辐照表面结构的变化是由于静电放电痕迹的出现及其上充满气体的气泡的形成,玻璃板背面的变化可能是由于在辐照表面发生静电放电时形成的冲击波引起的。在一定范围内,随着电子通量密度的增加,静电放电频率和泄漏电流也随之增加,但两者之间的相关性存在显著差异。在φ = 2.0·1010 cm-2s-1恒定值下的测量结果表明,随着电子通量从1014增加到5·1016 cm-2, ESR频率增加,但电磁脉冲幅度减小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Processes on the glass surface under irradiation with medium-energy electrons
The results of experimental studies of the processes occurring on the surface of protective glasses of solar batteries and elements of reflective coatings of high-orbit artificial Earth satellites (AES) under irradiation with electrons with an energy of 30 keV are presented. The studied samples were made on the basis of K-208 glass, while the samples of reflective coatings differed in the presence of silver and stainless steel layers on the reverse surface of the glass plates, deposited sequentially by the magnetron sputtering method. Electron irradiation of the samples was carried out in a vacuum of 10–4 Pa at a particle flux density (φ) from 1·109 to 8·1012 cm–2s–1; the surfaces of the samples before and after irradiation were examined by atomic force microscopy (AFM). On the irradiated surface of glass samples, electrostatic discharges (ESD) arose, the parameters of which were characterized by oscillograms of generated electromagnetic pulses; for elements of reflective coatings, leakage currents to the metal substrate were additionally measured. It was found that changes in the structure of the irradiated surface of the samples are due to the appearance of traces of ESD and the formation of gas-filled bubbles on it, and changes in the back surface of glass plates are caused, presumably, by shock waves formed when ESD occurs on the irradiated surface. The ESD frequency and leakage currents increase with increasing electron flux density in the specified range, but these dependences differ significantly. Measurements at a constant value of φ = 2.0·1010 cm–2s–1 showed that with an increase in the electron fluence from 1014 to 5·1016 cm–2, the ESR frequency increases, but the amplitude of electromagnetic pulses decreases.
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