光致发光法同时测定硅晶片载流子寿命和净掺杂浓度

J. Giesecke, D. Walter, F. Kopp, P. Rosenits, M. Schubert, W. Warta
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引用次数: 11

摘要

从理论上推导了准稳态光致发光(QSSPL)同时测定注入依赖的少数载流子寿命和晶体硅晶圆中净掺杂浓度的方法,并进行了实验实现。时间调制辐照强度最大值与相应的光致发光强度之间的时移与有效的少数载流子寿命有关。此外,辐照强度和光致发光强度的峰曲率之比揭示了各自材料的净掺杂浓度。因此,我们发现了一种基于发光的技术来确定硅片中与注入相关的少数载流子寿命,该技术既不需要载流子迁移率的先验信息,也不需要净掺杂剂浓度的先验信息。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Simultaneous determination of carrier lifetime and net dopant concentration of silicon wafers from photoluminescence
A simultaneous determination of injection dependent minority carrier lifetime and net dopant concentration in crystalline silicon wafers from quasi-steady-state photoluminescence (QSSPL) is theoretically derived and experimentally implemented. The time shift between maxima of a time modulated irradiation intensity and the respective photoluminescence intensity is linked to effective minority carrier lifetime. In addition, the ratio of peak curvatures of irradiation intensity and photoluminescence intensity reveals the net dopant concentration of the respective material. Thus, we found a luminescence based technique to determine injection dependent minority carrier lifetime in silicon wafers, which requires a priori information neither about carrier mobilities nor about net dopant concentration.
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