ONE-ANTENNA RADIATION PATTERN MEASUREMENT OF ON-WAFER ANTENNAS IN PROBE STATION ENVIRONMENT

—We propose and demonstrate the use of radiation pattern measurement method for on-wafer antennas for the first time that is capable of in-depth antenna characterization with limited equipment. This one-antenna method extracts gain without the need for a second antenna in the on-wafer probe station environment. A combination of reference reflector translation and rotation allows radiation pattern sampling at multiple angles enabling characterization over the relevant solid angle. Several microstrip patch antennas with varying beam directions (0 ◦ , 20 ◦ , and 30 ◦ ) were measured with the proposed method over 120 ◦ in the H -plane with good agreement between simulation and experiment. The method offers a cost-effective and time-efficient solution for probe-fed, on-wafer antenna radiation performance characterization.