单层MoSi2N4和MoSi2As4的谷赝自旋

Chen Yang, Z. Song, Xiaotian Sun, Jing Lu
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引用次数: 50

摘要

长期以来,二维六边形二硫化钼被认为是一种很有前途的谷电子材料。然而,MoS2中有限的生长尺寸和低载流子迁移率限制了其进一步的应用。最近,一种新型六边形二维MXene MoSi2N4被成功合成,具有大尺寸、优异的环境稳定性和可观的空穴迁移率。在本文中,基于第一性原理计算,我们预测在单层MoSi2N4及其衍生物MoSi2As4中可以实现谷对比特性。除了传统的两能级谷外,单层MoSi2As4中的谷是多重折叠的,这意味着一个新的谷维度。这种多重折叠谷可以用一个三波段低功率哈密顿量来描述。本文介绍了单层MoSi2N4和MoSi2As4在谷电子器件特别是多信息处理中的理论进展和潜在应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Valley pseudospin in monolayer MoSi2N4 and MoSi2As4
For a long time, two-dimensional (2D) hexagonal MoS2 was proposed as a promising material for valleytronic system. However, the limited size of growth and low carrier motilities in MoS2 restrict its further application. Very recently, a new kind of hexagonal 2D MXene, MoSi2N4, was successfully synthesized with large size, excellent ambient stability, and considerable hole mobility. In this paper, based on the first-principles calculations, we predict that the valley-contrast properties can be realized in monolayer MoSi2N4 and its derivative MoSi2As4. Beyond the traditional two-level valleys, the valleys in monolayer MoSi2As4 are multiple-folded, implying a new valley dimension. Such multiple-folded valleys can be described by a three-band low-power Hamiltonian. This study presents the theoretical advance and the potential applications of monolayer MoSi2N4 and MoSi2As4 in valleytronic devices, especially multiple information processing.
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