S. Fujii, M. Sumisaka, G. Tang, Yusuke Suzuki, S. Otomo, T. Omori, K. Hashimoto
{"title":"以Sc-Al合金为靶材制备高c轴取向的ScAlN薄膜","authors":"S. Fujii, M. Sumisaka, G. Tang, Yusuke Suzuki, S. Otomo, T. Omori, K. Hashimoto","doi":"10.1109/MWSYM.2015.7166841","DOIUrl":null,"url":null,"abstract":"ScAlN thin films were deposited by a conventional radiofrequency (RF)-magnetron sputtering system using two Sc-Al alloy metal targets with different Sc/Al ratios. A 10 h deposition time resulted in highly c-axis-oriented ScAlN thin films with Sc concentrations of 32 at% and 22 at% on Sc0.43-Al0.57 and Sc0.32-Al0.68 targets, respectively. C-axis orientation was lost in thin films deposited on the Sc0.43-Al0.57 target after sputtering times of over 50 h. XDS analysis showed a high-Sc-content ScAlN film with an amorphous phase layer near the Si substrate surface. A seed layer of c-axis-oriented ScAIN allowed for > 50 h deposition on the Sc0.43-Al0.57 target to result in highly c-axis-oriented ScAlN films. A one-port surface acoustic wave (SAW) resonator based on the ScAlN/Si structure has a K2 value of 2.7% at 2 GHz, six times larger than for that based on the AlN/Si structure.","PeriodicalId":6493,"journal":{"name":"2015 IEEE MTT-S International Microwave Symposium","volume":"44 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2015-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Highly c-axis-oriented ScAlN thin films deposited using Sc-Al alloy target\",\"authors\":\"S. Fujii, M. Sumisaka, G. Tang, Yusuke Suzuki, S. Otomo, T. Omori, K. Hashimoto\",\"doi\":\"10.1109/MWSYM.2015.7166841\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"ScAlN thin films were deposited by a conventional radiofrequency (RF)-magnetron sputtering system using two Sc-Al alloy metal targets with different Sc/Al ratios. A 10 h deposition time resulted in highly c-axis-oriented ScAlN thin films with Sc concentrations of 32 at% and 22 at% on Sc0.43-Al0.57 and Sc0.32-Al0.68 targets, respectively. C-axis orientation was lost in thin films deposited on the Sc0.43-Al0.57 target after sputtering times of over 50 h. XDS analysis showed a high-Sc-content ScAlN film with an amorphous phase layer near the Si substrate surface. A seed layer of c-axis-oriented ScAIN allowed for > 50 h deposition on the Sc0.43-Al0.57 target to result in highly c-axis-oriented ScAlN films. A one-port surface acoustic wave (SAW) resonator based on the ScAlN/Si structure has a K2 value of 2.7% at 2 GHz, six times larger than for that based on the AlN/Si structure.\",\"PeriodicalId\":6493,\"journal\":{\"name\":\"2015 IEEE MTT-S International Microwave Symposium\",\"volume\":\"44 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-05-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 IEEE MTT-S International Microwave Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MWSYM.2015.7166841\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE MTT-S International Microwave Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MWSYM.2015.7166841","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Highly c-axis-oriented ScAlN thin films deposited using Sc-Al alloy target
ScAlN thin films were deposited by a conventional radiofrequency (RF)-magnetron sputtering system using two Sc-Al alloy metal targets with different Sc/Al ratios. A 10 h deposition time resulted in highly c-axis-oriented ScAlN thin films with Sc concentrations of 32 at% and 22 at% on Sc0.43-Al0.57 and Sc0.32-Al0.68 targets, respectively. C-axis orientation was lost in thin films deposited on the Sc0.43-Al0.57 target after sputtering times of over 50 h. XDS analysis showed a high-Sc-content ScAlN film with an amorphous phase layer near the Si substrate surface. A seed layer of c-axis-oriented ScAIN allowed for > 50 h deposition on the Sc0.43-Al0.57 target to result in highly c-axis-oriented ScAlN films. A one-port surface acoustic wave (SAW) resonator based on the ScAlN/Si structure has a K2 value of 2.7% at 2 GHz, six times larger than for that based on the AlN/Si structure.
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