新型良好定义的聚苯乙烯-嵌段聚(丙交酯-共聚物)嵌段共聚物

O. Altintas
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引用次数: 0

摘要

详细报道了聚苯乙烯-嵌段聚(丙交酯-共聚物)PS-b-PLGA嵌段共聚物的制备方法。通过活阴离子聚合和开环聚合,成功制备了性能良好的PS-b-PLGA嵌段共聚物。首先,采用阴离子活性聚合法制备端羟基直线型聚苯乙烯。在1,8-重氮双环[5.4.0]十一-7-烯(DBU)作为催化剂的条件下,将所得聚合物作为大引发剂,在室温下在二氯甲烷中进行了丙交酯和乙二醇酯的开环共聚反应。通过优化催化剂浓度,使dbu引发聚合物的酯交换反应和生成最小化。合成了3种分子量为5000g /mol ~ 33600g /mol的嵌段共聚物,具有较低的多分散性。通过核磁共振波谱和阻垢层析观察了PS-b-PLGA嵌段共聚物的形成。用热重分析和差示扫描量热法研究了嵌段共聚物的热性能。利用小角x射线散射、掠射小角x射线散射以及原子力显微镜对嵌段共聚物的形貌进行了研究,结果表明,嵌段共聚物具有均匀畴尺寸的有序纳米结构。总的来说,这份手稿描述了一个扩展的聚合物工具箱,用于下一代光刻应用的基于plga的聚合物。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Novel Well-defined Polystyrene-block-Poly(lactide-co-glycolide) Block Copolymers
A facile preparation of polystyrene-block-poly(lactide-co-glycolide) PS-b-PLGA block copolymers was reported in detail. Well-defined PS-b-PLGA block copolymers were successfully obtained via living anionic polymerization and ring-opening polymerization. First, hydroxyl-terminated linear polystyrenes were prepared by living anionic polymerization. The resulting polymers were used as macroinitiators for ring-opening copolymerization of lactide and glycolide in the presence of the 1,8-diazabicyclo[5.4.0]undec-7-ene (DBU) as a catalyst in dichloromethane at ambient temperature. Transesterification and formation of DBU-initiated polymers were minimized by optimizing the catalyst concentration. Three block copolymers were synthesized in various molecular weights from 5000 g/mol to 33600 g/mol with low polydispersity. The formation of well-defined PS-b-PLGA block copolymers was followed by nuclear magnetic resonance spectroscopy and size-exclusion chromatography. Thermal properties of the block copolymers were investigated by thermal gravimetric analysis and differential scanning calorimetry. The morphology of the block copolymers was investigated using small-angle X-ray scattering in the bulk and via grazing incidence small-angle X-ray scattering as well as atomic force microscopy in thin film demonstrating organized nanostructures with uniform domain sizes. Overall, this manuscript describes an expanded polymer toolbox for PLGA-based polymers for next-generation lithography applications.
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