用椭偏法测量超薄薄膜的厚度、折射率及表面光学性质

F. McCrackin, E. Passaglia, R. Stromberg, H. L. Steinberg
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引用次数: 510

摘要

综述了椭偏仪在测量超薄薄膜厚度和折射率方面的应用。提出了光偏振状态的庞加莱球表示法,并用它来描述反射过程。对椭偏仪的操作细节进行了严格的检查。本文提出了一种计算方法,该方法可以直接从椭偏仪的读数计算出已知光学常数的反射衬底上已知折射率的薄膜的厚度。本文还提出了一种计算未知薄膜折射率和厚度的方法。这些方法已应用于铬铁板和金表面吸附水层厚度的测定。前者为23 ~ 27 Å,后者为2 ~ 5 Å。本文以在铬铁表面蒸发的氟化钡薄膜的厚度和折射率的测量为例,说明了这两个量的同时测定。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Measurement of the Thickness and Refractive Index of Very Thin Films and the Optical Properties of Surfaces by Ellipsometry1
The use of the ellipsometer for the measurement of the thickness and refractive index of very thin films is reviewed. The Poincaré sphere representation of the state of polarization of light is developed and used to describe the reflection process. Details of the operation of the ellipsometer are examined critically. A computational method is presented by which the thickness of a film of known refractive index on a reflecting substrate of known optical constants may be calculated directly from the ellipsometer readings. A method for computing both the refractive index and thickness of an unknown film is also developed. These methods have been applied to the determination of the thickness of an adsorbed water layer on chromium ferrotype plates and on gold surfaces. In the former case the thickness was 23 to 27 Å, and in the latter was 2 to 5 Å. The measurement of the thickness and refractive index of barium fluoride films evaporated on chromium ferrotype surfaces is used as an illustration of the simultaneous determination of these two quantities.
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