{"title":"从酸性硫酸铜浴中电沉积铜时，乙酸和生物碱卤素化合物在铜(100)平面上的吸附等温线","authors":"B.S. Sheshadri, S.M. Mayanna","doi":"10.1016/0300-9416(75)90041-3","DOIUrl":null,"url":null,"abstract":"<div><p>The effect of halogen compounds of acetic acid, strychnin and quinin sulphates on the deposition of copper on a copper(100) plane was studied. The exchange current densities (<em>i</em><sub>0</sub>) were evaluated using Tafel relations with and without addition agents. The concentration of addition agent had a significant influence on the <em>i</em><sub>0</sub> value. Surface coverages determined from the <em>i</em><sub>0</sub> values were consistent and fitted the Langmuir adsorption isotherm. The free energies of adsorption of chloro and bromo acetic acids are negative, indicating the strong adsorption and inhibition of the deposition process by these addition agents.</p></div>","PeriodicalId":100399,"journal":{"name":"Electrodeposition and Surface Treatment","volume":"3 3","pages":"Pages 189-194"},"PeriodicalIF":0.0000,"publicationDate":"1975-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0300-9416(75)90041-3","citationCount":"6","resultStr":"{\"title\":\"Adsorption isotherms of halogen compounds of acetic acid and alkaloids on a copper(100) plane during electrodeposition of copper from acid copper sulphate baths\",\"authors\":\"B.S. Sheshadri, S.M. Mayanna\",\"doi\":\"10.1016/0300-9416(75)90041-3\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>The effect of halogen compounds of acetic acid, strychnin and quinin sulphates on the deposition of copper on a copper(100) plane was studied. The exchange current densities (<em>i</em><sub>0</sub>) were evaluated using Tafel relations with and without addition agents. The concentration of addition agent had a significant influence on the <em>i</em><sub>0</sub> value. Surface coverages determined from the <em>i</em><sub>0</sub> values were consistent and fitted the Langmuir adsorption isotherm. The free energies of adsorption of chloro and bromo acetic acids are negative, indicating the strong adsorption and inhibition of the deposition process by these addition agents.</p></div>\",\"PeriodicalId\":100399,\"journal\":{\"name\":\"Electrodeposition and Surface Treatment\",\"volume\":\"3 3\",\"pages\":\"Pages 189-194\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1975-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0300-9416(75)90041-3\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electrodeposition and Surface Treatment\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/0300941675900413\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrodeposition and Surface Treatment","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0300941675900413","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Adsorption isotherms of halogen compounds of acetic acid and alkaloids on a copper(100) plane during electrodeposition of copper from acid copper sulphate baths
The effect of halogen compounds of acetic acid, strychnin and quinin sulphates on the deposition of copper on a copper(100) plane was studied. The exchange current densities (i0) were evaluated using Tafel relations with and without addition agents. The concentration of addition agent had a significant influence on the i0 value. Surface coverages determined from the i0 values were consistent and fitted the Langmuir adsorption isotherm. The free energies of adsorption of chloro and bromo acetic acids are negative, indicating the strong adsorption and inhibition of the deposition process by these addition agents.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
