{"title":"78.8fJ/b/mm 12.0Gb/s/线电容驱动片上链路与fe联合地强迫偏置技术在65nm CMOS DRAM全球总线线","authors":"Sangyoon Lee, Jaekwang Yun, Suhwan Kim","doi":"10.1109/ISSCC42614.2022.9731653","DOIUrl":null,"url":null,"abstract":"Advances in virtual reality, artificial intelligence, and big data have increased demand for high-bandwidth memory. Accordingly, pre-fetch sizes have also increased with DRAM generations, meaning an increased number of global bus lines. An increase to this number is limited as it also increases the chip size; instead, the data-rate per lane can be increased for higher throughput [1]. As the global bus lines are on-chip wires in a DRAM chip, they can be driven capacitively. Prior work [2], [3] has shown the superior efficiency of capacitive drivers, over conventional repeaters, in driving on-chip wires at the cost of a reduced voltage swing. However, as there is no well-defined DC level on the capacitively-driven wires [4], wire biasing is fraught with implementation challenges [3]. To define the DC potential on the interconnect, prior work sent signals differentially [2], [4], [5] or dissipated static power to define the DC level [3]. Unfortunately, these approaches may not be preferable for DRAM chips that require dense and energy-efficient data transfers.","PeriodicalId":6830,"journal":{"name":"2022 IEEE International Solid- State Circuits Conference (ISSCC)","volume":"31 1","pages":"454-456"},"PeriodicalIF":0.0000,"publicationDate":"2022-02-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A 78.8fJ/b/mm 12.0Gb/s/Wire Capacitively Driven On-Chip Link Over 5.6mm with an FFE-Combined Ground-Forcing Biasing Technique for DRAM Global Bus Line in 65nm CMOS\",\"authors\":\"Sangyoon Lee, Jaekwang Yun, Suhwan Kim\",\"doi\":\"10.1109/ISSCC42614.2022.9731653\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Advances in virtual reality, artificial intelligence, and big data have increased demand for high-bandwidth memory. Accordingly, pre-fetch sizes have also increased with DRAM generations, meaning an increased number of global bus lines. An increase to this number is limited as it also increases the chip size; instead, the data-rate per lane can be increased for higher throughput [1]. As the global bus lines are on-chip wires in a DRAM chip, they can be driven capacitively. Prior work [2], [3] has shown the superior efficiency of capacitive drivers, over conventional repeaters, in driving on-chip wires at the cost of a reduced voltage swing. However, as there is no well-defined DC level on the capacitively-driven wires [4], wire biasing is fraught with implementation challenges [3]. To define the DC potential on the interconnect, prior work sent signals differentially [2], [4], [5] or dissipated static power to define the DC level [3]. Unfortunately, these approaches may not be preferable for DRAM chips that require dense and energy-efficient data transfers.\",\"PeriodicalId\":6830,\"journal\":{\"name\":\"2022 IEEE International Solid- State Circuits Conference (ISSCC)\",\"volume\":\"31 1\",\"pages\":\"454-456\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-02-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 IEEE International Solid- State Circuits Conference (ISSCC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSCC42614.2022.9731653\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE International Solid- State Circuits Conference (ISSCC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSCC42614.2022.9731653","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A 78.8fJ/b/mm 12.0Gb/s/Wire Capacitively Driven On-Chip Link Over 5.6mm with an FFE-Combined Ground-Forcing Biasing Technique for DRAM Global Bus Line in 65nm CMOS
Advances in virtual reality, artificial intelligence, and big data have increased demand for high-bandwidth memory. Accordingly, pre-fetch sizes have also increased with DRAM generations, meaning an increased number of global bus lines. An increase to this number is limited as it also increases the chip size; instead, the data-rate per lane can be increased for higher throughput [1]. As the global bus lines are on-chip wires in a DRAM chip, they can be driven capacitively. Prior work [2], [3] has shown the superior efficiency of capacitive drivers, over conventional repeaters, in driving on-chip wires at the cost of a reduced voltage swing. However, as there is no well-defined DC level on the capacitively-driven wires [4], wire biasing is fraught with implementation challenges [3]. To define the DC potential on the interconnect, prior work sent signals differentially [2], [4], [5] or dissipated static power to define the DC level [3]. Unfortunately, these approaches may not be preferable for DRAM chips that require dense and energy-efficient data transfers.