双极电子回旋质共振等离子体中的双极晶体管辐射强度提高

Е. А. Полушкин, С.В. Нефедьев, О.А. Солтанович, Анастасия Викторовна Ковальчук, С. Ю. Шаповал
{"title":"双极电子回旋质共振等离子体中的双极晶体管辐射强度提高","authors":"Е. А. Полушкин, С.В. Нефедьев, О.А. Солтанович, Анастасия Викторовна Ковальчук, С. Ю. Шаповал","doi":"10.21883/ftp.2023.03.55633.4467","DOIUrl":null,"url":null,"abstract":"We demonstrate significant improvement of the radiation immunity of the integrated circuits based on silicon bipolar transistors. Strong decrease of the current gain degradation and significant yield improvement after high-energy gamma irradiation are both shown. This was achieved by development of efficient hydrogenation process for the silicon bulk and the surface dielectric layer using electron cyclotron resonance (ECR) plasma, as well as implementation of effective Si-plate gettering option.","PeriodicalId":24054,"journal":{"name":"Физика и техника полупроводников","volume":"8 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2023-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Повышение радиационной стойкости интегральных схем на основе биполярных транзисторов обработкой в водородной электронно циклотронно резонансной плазме и геттерированием Si-пластин\",\"authors\":\"Е. А. Полушкин, С.В. Нефедьев, О.А. Солтанович, Анастасия Викторовна Ковальчук, С. Ю. Шаповал\",\"doi\":\"10.21883/ftp.2023.03.55633.4467\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We demonstrate significant improvement of the radiation immunity of the integrated circuits based on silicon bipolar transistors. Strong decrease of the current gain degradation and significant yield improvement after high-energy gamma irradiation are both shown. This was achieved by development of efficient hydrogenation process for the silicon bulk and the surface dielectric layer using electron cyclotron resonance (ECR) plasma, as well as implementation of effective Si-plate gettering option.\",\"PeriodicalId\":24054,\"journal\":{\"name\":\"Физика и техника полупроводников\",\"volume\":\"8 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Физика и техника полупроводников\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.21883/ftp.2023.03.55633.4467\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Физика и техника полупроводников","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.21883/ftp.2023.03.55633.4467","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

我们证明了基于硅双极晶体管的集成电路的抗辐射能力有了显著的提高。高能γ辐照后,电流增益衰减明显减小,产率显著提高。这是通过开发利用电子回旋共振(ECR)等离子体对硅本体和表面介电层进行高效加氢的工艺,以及实施有效的硅板吸光选项来实现的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Повышение радиационной стойкости интегральных схем на основе биполярных транзисторов обработкой в водородной электронно циклотронно резонансной плазме и геттерированием Si-пластин
We demonstrate significant improvement of the radiation immunity of the integrated circuits based on silicon bipolar transistors. Strong decrease of the current gain degradation and significant yield improvement after high-energy gamma irradiation are both shown. This was achieved by development of efficient hydrogenation process for the silicon bulk and the surface dielectric layer using electron cyclotron resonance (ECR) plasma, as well as implementation of effective Si-plate gettering option.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信