汞蒸气对硫化物非晶薄膜电阻的影响

IF 0.9 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY
V. M. Rubish, V. Kyrylenko, M. Durkot, V. Boryk, R. Dzumedzey, I. Yurkin, M. Pop, Y. Myslo
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引用次数: 0

摘要

采用平面结构“Ni层-硫系非晶膜- Ni层”和“石墨探针-硫系非晶膜石墨探针”样品,研究了汞蒸气对Se-Te、Se-Sb和Se-As体系非晶膜电阻的影响。经证实,样品暴露在汞蒸气中会使其电阻降低4-7个数量级。随着温度和汞浓度的增加,从高阻态到低阻态的转变时间缩短。在非晶态硒中引入Te、Sb和As,并增加其在薄膜组成中的浓度,转变时间增加,电阻变化率减小。结果表明,电阻值的变化主要是由硫系薄膜表面电导率的变化决定的。用汞修饰的含硒非晶薄膜的电阻降低是由于在其基体中形成了HgSe晶体夹杂物。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The influence of mercury vapor on the electrical resistance of chalcogenide amorphous films
Using the planar structures "Ni layer - chalcogenide amorphous film - Ni layer" and "graphite probe - chalcogenide amorphous film graphite probe" samples, the influence of mercury vapor on the electrical resistance of amorphous films of the Se-Te, Se-Sb and Se-As systems was investigated. It was established that exposure of samples in mercury vapor leads to a decrease in their electrical resistance by 4-7 orders of magnitude. As the temperature and mercury concentration increase, the transition time from a high-resistance state to a low-resistance state decreases. When introducing Te, Sb, and As into amorphous selenium and increasing their concentration in the composition of the films, the transition time increases, and the value of the change in resistance decreases. It was established that the change in resistance is mainly determined by the change in surface conductivity of chalcogenide films. A decrease in the electrical resistance of selenium-containing amorphous films modified with mercury is caused by the formation of HgSe crystalline inclusions in their matrix.
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来源期刊
CiteScore
1.70
自引率
14.30%
发文量
83
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