MoSiB/Hf镶嵌靶磁控溅射制备Mo-Hf-Si-B涂层的结构与性能

A. Sytchenko, E. Levashov, P. Kiryukhantsev-Korneev
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引用次数: 0

摘要

采用磁控溅射法制备了Mo-Si-B和Mo-Hf-Si-B镀层。采用扫描电子显微镜、能谱、x射线衍射分析和拉曼光谱对其结构和组成进行了研究。在0.25 ~ 1.0 n的载荷下,在显微硬度计上研究了涂层的抗裂性能。在空气中1000℃、总暴露300 min下研究了氧化动力学。在1500℃下短期退火测试了涂层的耐热性。采用伏安法在1N H2SO4溶液中进行电化学测试。结果表明:采用2 Hf段制备的Mo-Si-B涂层和Mo-Hf-Si-B涂层呈柱状结构;在涂层沉积中使用4Hf段可以增加密度并抑制不良柱状结构的形成。结果表明,在涂层成分中加入铪使h-MoSi2相的生长速率提高了20%,使主要组分的晶粒尺寸减小了一个数量级,同时促进了HfB2的形成。Mo-Si-B涂层获得了最大硬度(27 GPa)、杨氏模量(370 GPa)和弹性回复率(62%)。使用2和4 Hf段得到的镀层硬度分别降低1.9倍和1.6倍。在Mo-Si-B和Mo-Hf-Si-B (2Hf)涂层微压痕过程中,观察到径向开裂。得到的样品中含铪浓度最大时,其抗裂性能最好。电化学试验表明,Mo-Hf-Si-B (2Hf)→Mo-Si-B→Mo-Hf-Si-B (4Hf)系列涂层的耐蚀性提高。所有涂层在1000和1500℃时均表现出良好的抗氧化性能。然而,Mo-Si-B和Mo-Hf-Si-B (2Hf)样品表面存在涂层脱层区域。Mo-Hf-Si-B (4Hf)涂层由于形成了致密的SiO2 + hfo保护层,具有较低的氧化层厚度和较好的抗氧化性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Structure and properties of Mo–Hf–Si–B coatings obtained by magnetron sputtering using MoSiB/Hf mosaic target
Mo–Si–B and Mo–Hf–Si–B coatings were produced by magnetron sputtering of a MoSiB ceramic target equipped with 2 or 4 Hf segments. Their structure and composition were studied by scanning electron microscopy, energy dispersive spectro scopy, X-ray diffraction analysis, and Raman spectroscopy. Mechanical properties were determined by nanoindentation at a load of 4 N. The crack resistance of coatings was studied on a microhardness tester at loads of 0.25–1.0 N. The oxidation kinetics was studied at 1000 °C in air with a total exposure of 300 min. The heat resistance of coatings was determined as a result of short-term annealing at 1500 °C. Electrochemical tests were carried out by voltammetry in the 1N H2SO4 solution. The results showed that the Mo–Si–B coating and Mo–Hf–Si–B coating obtained using 2 Hf segments feature by a columnar structure. The use of 4Hf segments in coating deposition led to an increase in density and suppression of the undesirable columnar structure formation. It was shown that hafnium introduction into the coating composition increases the growth rate by 20% and reduces the grain size of the main component of the h-MoSi2 phase by an order of magnitude, while simultaneously promoting HfB2 formation. Maximum hardness (27 GPa), Young’s modulus (370 GPa) and elastic recovery (62 %) were achieved for the Mo-Si-B coating. The hardness of coatings obtained using 2 and 4 Hf segments decreases by 1.9 and 1.6 times, respectively. During the Mo–Si–B and Mo–Hf–Si–B (2Hf) coating microindentation, radial cracking was observed. The sample obtained with the maximum concentration of hafnium featured by the best crack resistance. Electrochemical tests showed that the corrosion resistance of coatings increases in the Mo–Hf–Si–B (2Hf) → Mo–Si–B → Mo–Hf–Si–B (4Hf) series. All coatings showed good oxidation resistance at 1000 and 1500 °C. However, coating delamination areas were observed on the surface of Mo–Si–B and Mo–Hf–Si–B (2Hf) samples. The Mo–Hf–Si–B (4Hf) coating showed a lower oxide layer thickness and better oxidation resistance due to the dense SiO2 + HfOх protective layer formation.
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