难熔化合物成膜过程建模的特点

A. Goncharov, A. Yunda, Ivan S. Kolinko, S. Goncharova, Oleksii Fesenko
{"title":"难熔化合物成膜过程建模的特点","authors":"A. Goncharov, A. Yunda, Ivan S. Kolinko, S. Goncharova, Oleksii Fesenko","doi":"10.1109/NAP51885.2021.9568616","DOIUrl":null,"url":null,"abstract":"The features of modeling the processes of formation of films of refractory compounds are considered by the example of transition metal nitrides. A brief description of modern methods for modeling the growth of coatings is given. And also outlined the range of tasks to be solved.","PeriodicalId":6735,"journal":{"name":"2021 IEEE 11th International Conference Nanomaterials: Applications & Properties (NAP)","volume":"48 1","pages":"1-5"},"PeriodicalIF":0.0000,"publicationDate":"2021-09-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Features of Modeling the Processes of Formation of Films of Refractory Compounds\",\"authors\":\"A. Goncharov, A. Yunda, Ivan S. Kolinko, S. Goncharova, Oleksii Fesenko\",\"doi\":\"10.1109/NAP51885.2021.9568616\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The features of modeling the processes of formation of films of refractory compounds are considered by the example of transition metal nitrides. A brief description of modern methods for modeling the growth of coatings is given. And also outlined the range of tasks to be solved.\",\"PeriodicalId\":6735,\"journal\":{\"name\":\"2021 IEEE 11th International Conference Nanomaterials: Applications & Properties (NAP)\",\"volume\":\"48 1\",\"pages\":\"1-5\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-09-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2021 IEEE 11th International Conference Nanomaterials: Applications & Properties (NAP)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/NAP51885.2021.9568616\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE 11th International Conference Nanomaterials: Applications & Properties (NAP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NAP51885.2021.9568616","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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摘要

以过渡金属氮化物为例,分析了难熔化合物成膜过程建模的特点。简要介绍了模拟涂层生长的现代方法。并概述了要解决的任务范围。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Features of Modeling the Processes of Formation of Films of Refractory Compounds
The features of modeling the processes of formation of films of refractory compounds are considered by the example of transition metal nitrides. A brief description of modern methods for modeling the growth of coatings is given. And also outlined the range of tasks to be solved.
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