{"title":"cu0.1 ni0.1 co1.6 mn1.2 o4基陶瓷材料的降解动力学","authors":"H. Klym, I. Karbovnyk, D. Lukashevych, Y. Kostiv","doi":"10.1109/UkrMiCo47782.2019.9165493","DOIUrl":null,"url":null,"abstract":"Degradation kinetics in thick films based on Cu<inf>0.1</inf>Ni<inf>0.1</inf>Co<inf>1.6</inf>Mn<inf>1.2</inf>O<inf>4</inf> ceramics at temperature of 170 <sup>o</sup>C have been investigated. Analytical description of processes in these materials was performed using relaxation functions. It is shown, that studied degradation kinetics are adequately described by compression-exponential relaxation function.","PeriodicalId":6754,"journal":{"name":"2019 International Conference on Information and Telecommunication Technologies and Radio Electronics (UkrMiCo)","volume":"14 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2019-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Degradation Kinetics in Cu0.1Ni0.1Co1.6Mn1.2O4-based ceramic materials\",\"authors\":\"H. Klym, I. Karbovnyk, D. Lukashevych, Y. Kostiv\",\"doi\":\"10.1109/UkrMiCo47782.2019.9165493\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Degradation kinetics in thick films based on Cu<inf>0.1</inf>Ni<inf>0.1</inf>Co<inf>1.6</inf>Mn<inf>1.2</inf>O<inf>4</inf> ceramics at temperature of 170 <sup>o</sup>C have been investigated. Analytical description of processes in these materials was performed using relaxation functions. It is shown, that studied degradation kinetics are adequately described by compression-exponential relaxation function.\",\"PeriodicalId\":6754,\"journal\":{\"name\":\"2019 International Conference on Information and Telecommunication Technologies and Radio Electronics (UkrMiCo)\",\"volume\":\"14 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 International Conference on Information and Telecommunication Technologies and Radio Electronics (UkrMiCo)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/UkrMiCo47782.2019.9165493\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 International Conference on Information and Telecommunication Technologies and Radio Electronics (UkrMiCo)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/UkrMiCo47782.2019.9165493","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Degradation Kinetics in Cu0.1Ni0.1Co1.6Mn1.2O4-based ceramic materials
Degradation kinetics in thick films based on Cu0.1Ni0.1Co1.6Mn1.2O4 ceramics at temperature of 170 oC have been investigated. Analytical description of processes in these materials was performed using relaxation functions. It is shown, that studied degradation kinetics are adequately described by compression-exponential relaxation function.
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