硅中氧精华发光中心激励效率

Н. А. Соболев, А. Калядин, К.Ф. Штельмах, Е.И. Шек, В.И. Сахаров, И.Т. Серенков
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引用次数: 0

摘要

在p型含氧硅沉淀中,研究了泵浦功率对位错相关发光中心光致发光强度的影响。在微电子技术中,用于形成快速扩散杂质的吸气剂的三阶段退火导致氧沉淀,而D1和D2位错相关的发光中心是在1000°С氩气流中随后退火过程中产生的。在液氦温度下测量了D1和D2谱线的光致发光激发效率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Эффективность возбуждения центров дислокационной люминесценции в кремнии с кислородными преципитатами
Effect of the pump power on the photoluminescence intensity for dislocation-related luminescence centers is studied in p-type silicon containing oxygen precipitates. Oxygen precipitates are induced as a result of three-stage annealing used for formation of a getter for fast diffusing impurities in microelectronics technology while D1 and D2 dislocation-related luminescence centers were produced during subsequent annealing in a flow of argon at 1000°С. The photoluminescence excitation efficiencies for the D1 and D2 lines were measured at a temperature of liquid helium.
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