标准细胞库的最佳P/N宽度比选择

David S. Kung, R. Puri
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引用次数: 27

摘要

在深亚微米高性能电路中,为了满足日益严格的时序限制,逻辑合成的有效性在很大程度上取决于标准单元库中可用逻辑门的范围和种类。高性能标准单元库的设计研究主要集中在各种逻辑门的驱动强度选择上。由于CMOS逻辑电路延迟不仅取决于每个栅极的驱动强度,而且取决于其PM宽度比,因此为每个单元提供良好的PM宽度比至关重要。本文的主要贡献是开发了一个理论框架,通过该框架,库设计者可以确定其高性能标准单元库中每个逻辑门的“最佳”PM宽度比。该理论框架利用新的门延迟模型,明确表示延迟对P/N宽度比和负载的依赖。这些延迟模型为CMOS门提供了0.12 /spl mu/m L/sub /深亚微米技术的高精度延迟。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optimal P/N width ratio selection for standard cell libraries
The effectiveness of logic synthesis to satisfy increasingly tight timing constraints in deep-submicron high-performance circuits heavily depends on the range and variety of logic gates available in the standard cell library. Primarily, research in the design of high-performance standard cell libraries has been focused on drive strength selection of various logic gates. Since CMOS logic circuit delays not only depend on the drive strength of each gate but also on its PM width ratio, it is crucial to provide good PM width ratios for each cell. The main contribution of this paper is the development of a theoretical framework through which library designers can determine "optimal" PM width ratio for each logic gate in their high-performance standard cell library. This theoretical framework utilizes new gate delay models that explicitly represent the dependence of delay on P/N width ratio and load. These delay models yield highly accurate delay for CMOS gates in a 0.12 /spl mu/m L/sub eff/ deep-submicron technology.
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