薄膜晶体管(TFT)和微电子应用中透明薄膜的制备

Peshal Pokharel, L. Shrestha
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摘要

薄膜晶体管(TFT)是一种特殊类型的金属氧化物半导体场效应晶体管(MOSFET),它是通过在绝缘衬底上涂覆有源半导体层、金属触点和介电层而制成的。FET晶体管由三个主要部件组成:源极、栅极和漏极。本研究的主要目的是利用自旋镀膜和喷雾热解的方法在玻璃基板上生长ZnO纳米结构来制备通道组件。以乙酸锌、乙醇和氨水为前驱体,采用自旋镀膜技术在玻璃衬底上制备了氧化锌薄膜。沉积后,将膜离心蒸发。喷雾热解的应用已经被用于沉积各种各样的薄膜,这些薄膜被用于各种器件,如太阳能电池、传感器和固体氧化物燃料电池。研究发现,沉积薄膜的性能往往取决于制备条件;前驱体溶液的浓度、镀膜时间、玻璃基板的电学和光学性质等。生长温度为3400C时,F1、F5、F52和F57样品的平均电阻分别为8.7 Ω、9.14 Ω、8.9 Ω和9.42 Ω, F2、F29、F39和F53样品的平均电阻分别为9.5 Ω、9.3 Ω、9.9 Ω和10.0 Ω。ZnO薄膜在电磁波谱的可见光和近红外区域之间具有高透明度,并且随着ZnO种子层的三层,每个样品的透射率降低。样品透射率的降低证实了ZnO种子层的覆盖。这项工作表明,透明薄膜可以使用当地可用材料开发的当地技术,使用危害较小的化学试剂(如醋酸锌)来制造。这种制备的薄膜具有光学吸收性和固有的透射性,进一步表明它们可以用作薄膜晶体管中的沟道材料。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fabrication of Transparent Thin Film for Application of Thin Film Transistor (TFT) and Microelectronics
A thin-film transistor (TFT) is a special type of metal-oxide-semiconductor field-effect transistor (MOSFET) made by coating an insulating substrate with layers of an active semiconductor layer, metallic contacts, and the dielectric layer. FET transistors consist of three main components: source, gate, and drain. The main objective of the work is to fabricate the channel component by growing the ZnO nanostructure on the glass substrate using spin coating and spray pyrolysis methods. Thin films of zinc oxide (ZnO) were deposited on glass substrates by spin coating techniques from a precursor solution containing zinc acetate, ethanol and hydroxide of ammonia. After deposition, the films were centrifuged and evaporated. The application of spray pyrolysis has been used to deposit a wide variety of thin films, which are used in a variety of devices, such as solar cells, sensors and solid oxide fuel cells. It has been observed that the properties of the deposited thin films often depend on the preparation conditions; concentration levels of the precursor solution, coating time, electrical and optical properties of the glass substrate, etc. The average resistance of the sheet of samples F1, F5, F52, and F57 was 8.7 Ω, 9.14 Ω, 8.9 Ω and 9.42 Ω and of the samples, F2, F29, F39, and F53 were 9.5 Ω, 9.3 Ω, 9.9 Ω, 10.0 Ω respectively, at a growth temperature of 3400C. The thin films of ZnO were found to be highly transparent between the visible and near-infrared regions of the electromagnetic spectrum and the transmission of each sample decreases with three layers of ZnO seed layer. The decrease in the transmission of the samples confirms the coating of the ZnO seed layer on it. This work has demonstrated that transparent thin films can be fabricated using local techniques developed from locally available materials using less harmful chemical reagents such as zinc acetate. Such fabricated films are optically absorptive and inherently transmissive, further suggesting that they can be used as a channel material in thin film transistors.
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