通过研究P:ZnO/Ga2O3异质结的光响应特性,验证P型磷(P)掺杂ZnO薄膜形成的稳定性

Archishman Saha, M. Mishra, R. Saha, A. Dalal, Ankita Sengupta, A. Mondal, S. Chattopadhyay, S. Chakrabarti
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引用次数: 0

摘要

在ZnO薄膜中形成可复制的p型电导率是目前几种基于异质结的全透明光电器件的制造极具挑战性的。本研究通过低成本的SOD工艺沉积P型P: ZnO薄膜,然后在其上沉积本质n型Ga2O3薄膜,通过与n-Ga2O3形成垂直异质结来验证ZnO的P型导电性。采用射频溅射法制备ZnO薄膜,并利用超氧化物歧化酶技术对其进行p掺杂。这涉及通过在炉中800°C热退火过程中堆叠掺杂源,将邻近扩散的掺杂剂扩散到自旋涂层薄膜中。采用射频溅射技术在P: ZnO薄膜上沉积Ga2O3薄膜,形成异质结。电气测量是通过在照明和黑暗条件下使用电流-电压(I-V)测量来完成的。测量了器件的光开关性能和响应性。观察到P: ZnO/Ga2O3异质结在双波长区域表现出光响应。对应的两个响应峰分别出现在200 nm和390 nm附近,值分别为68.03 A/W和7.93 A/W (5 V时)。这两个峰源于Ga2O3 (4.7eV)和P: ZnO (3.1 eV)的超宽带隙。此外,该异质结在5 V(上升时间:230 ms,下降时间:163 ms)和- 5 V(上升时间:83 ms,下降时间:169 ms)的白光下显示出快速的切换速度,这与其他报道的结果相当。因此,目前的研究表明,利用超氧化物歧化酶技术开发出高度稳定和可重复的P型P: ZnO薄膜,并通过制造P: ZnO/Ga2O3异质结来验证P型形成,用于双波长选择紫外探测器的应用,这种探测器可以成为各种光电器件的潜在候选。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Validation of stable p-type phosphorus (P) doped ZnO thin films formation by investigating the photoresponse properties of P:ZnO/Ga2O3 heterojunctions
The formation of reproducible p-type conductivity in ZnO thin films is highly challenging now a days for the fabrication of several homo/heterojunction based fully transparent opto-electronic devices. In this study, p-type P: ZnO thin films are deposited by cost-effective SOD process and then intrinsically n-type Ga2O3 films are deposited on it to validate the p-type conductivity of ZnO by making vertical heterojunction with n-Ga2O3. The ZnO thin films are deposited by RF sputtering and subsequent P-doping is done by using the SOD technique on it. This involves proximity diffusing dopants into a spin-coated film by stacking the dopant source during thermal annealing at 800◦C for four hours in the furnace. Ga2O3 films are deposited on the P: ZnO films by using RF sputtering technique, for making the heterojunction. The electrical measurements are performed by using current-voltage (I-V) measurements under illuminated and dark conditions. The photo-switching and responsivity are also measured on the fabricated device. It is observed that the P: ZnO/Ga2O3 heterojunction exhibits the photoresponse in the dual wavelength region. The corresponding two peaks of responsivity are found around 200 nm and 390 nm with the values of 68.03 A/W and 7.93 A/W (at 5 V), respectively. Such two peaks originated due to the ultra-wide bandgaps of Ga2O3 (4.7eV) and P: ZnO (3.1 eV). Also, such heterojunction shows a rapid switching speed under white light at 5 V (rise time: 230 ms, fall time: 163 ms) and −5 V (rise time: 83 ms, Fall time: 169 ms), which is comparable with the other reported results. Therefore, the current study demonstrates the development of highly stable and reproducible p-type P: ZnO thin films by employing SOD technique and the validation of p-type formation by fabricating P: ZnO/Ga2O3 heterojunctions for dual-wavelength selector UV detector application and such detectors can be a potential candidate for various optoelectronic devices.
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