{"title":"氢气处理对ZnO薄膜特性的影响","authors":"Lung-Chien Chen, Ching-Ho Tien","doi":"10.2174/1874846500902010011","DOIUrl":null,"url":null,"abstract":"This study presents a zinc oxide (ZnO) film deposited on a glass substrate by ultrasonic spraying pyrolysis. The ZnO nanostructure was formed by treating the as-deposited ZnO films with hydrogen. The root-mean-square (RMS) roughness increases from 5.83 nm to 12.53 nm during the treatment for 20 min, but slightly decreases to 11.87 nm at a treatment time of 30 min. In the range 400-500 nm, the transparency of all the films with hydrogen treatment is slightly lower than that of the untreated films. The slight drop in the transparency of the films with hydrogen treatment is caused by scattering from pin-holes or nanostructures on the surface.","PeriodicalId":23072,"journal":{"name":"The Open Crystallography Journal","volume":"2 1","pages":"11-14"},"PeriodicalIF":0.0000,"publicationDate":"2009-05-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"The Influence of Hydrogen Gas Treatment on the Characteristics of ZnO Films\",\"authors\":\"Lung-Chien Chen, Ching-Ho Tien\",\"doi\":\"10.2174/1874846500902010011\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This study presents a zinc oxide (ZnO) film deposited on a glass substrate by ultrasonic spraying pyrolysis. The ZnO nanostructure was formed by treating the as-deposited ZnO films with hydrogen. The root-mean-square (RMS) roughness increases from 5.83 nm to 12.53 nm during the treatment for 20 min, but slightly decreases to 11.87 nm at a treatment time of 30 min. In the range 400-500 nm, the transparency of all the films with hydrogen treatment is slightly lower than that of the untreated films. The slight drop in the transparency of the films with hydrogen treatment is caused by scattering from pin-holes or nanostructures on the surface.\",\"PeriodicalId\":23072,\"journal\":{\"name\":\"The Open Crystallography Journal\",\"volume\":\"2 1\",\"pages\":\"11-14\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-05-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"The Open Crystallography Journal\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.2174/1874846500902010011\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Open Crystallography Journal","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2174/1874846500902010011","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The Influence of Hydrogen Gas Treatment on the Characteristics of ZnO Films
This study presents a zinc oxide (ZnO) film deposited on a glass substrate by ultrasonic spraying pyrolysis. The ZnO nanostructure was formed by treating the as-deposited ZnO films with hydrogen. The root-mean-square (RMS) roughness increases from 5.83 nm to 12.53 nm during the treatment for 20 min, but slightly decreases to 11.87 nm at a treatment time of 30 min. In the range 400-500 nm, the transparency of all the films with hydrogen treatment is slightly lower than that of the untreated films. The slight drop in the transparency of the films with hydrogen treatment is caused by scattering from pin-holes or nanostructures on the surface.
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