1Mb 4T-2MTJ非易失性STT-RAM,用于嵌入式存储器,采用32b细粒度电源门控技术,唤醒/关闭时间为1.0ns/200ps

T. Ohsawa, H. Koike, S. Miura, H. Honjo, K. Tokutome, S. Ikeda, T. Hanyu, H. Ohno, T. Endoh
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引用次数: 57

摘要

采用90nm CMOS和MTJ工艺设计和制造了采用4T-2MTJ电池的1Mb非易失性STT-RAM。沿一字线(WL)的32个单元同时进行电源选通,分别以1.0ns/200ps的快速唤醒/关机时间进行电源选通,以减少芯片的工作功率和消除待机功率。实验表明,在Vdd=1V时,该电池可以保持静态噪声裕度(SNM)为0.32V的数据。该芯片容量为1Mb,单元面积为2.19μm2,在10ns周期下,阵列访问时间为8ns,读取功率为10.7mW。1Mb STT-RAM的宏观尺寸预计将在45nm及以后变得比1Mb 6T-SRAM小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
1Mb 4T-2MTJ nonvolatile STT-RAM for embedded memories using 32b fine-grained power gating technique with 1.0ns/200ps wake-up/power-off times
A 1Mb nonvolatile STT-RAM using the 4T-2MTJ cell is designed and fabricated using 90nm CMOS and MTJ processes. 32 cells along a word line (WL) are simultaneously power-gated with quick wake-up/power-off times of 1.0ns/200ps, respectively, to reduce operation power and to eliminate standby power of the chip. The cell is experimentally shown to retain data with static noise margin (SNM) 0.32V under Vdd=1V. The 1Mb chip with 2.19μm2 cell is successfully operated with array access time of 8ns and read power of 10.7mW under 10ns cycle. The macro size of 1Mb STT-RAM is predicted to become smaller than the 1Mb 6T-SRAM in 45nm and beyond.
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