ErAs/GaAs异质结的错配位错

J.G. Zhu , C.J. Palmstrøm , C.B. Carter
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引用次数: 3

摘要

利用透射电子显微镜(TEM)的弱光束技术研究了分子束外延生长的ErAs/GaAs界面上的错配位错。观察到的位错构型与“金刚石-立方”结构材料异质结处的位错构型明显不同。观察到几乎正交的位错网络,位错大致沿[010]和[001]位错分布,以及蜂窝状位错网络。随着ErAs层厚度的增加,位错密度增大。讨论了a/2 < 110 >型位错之间不同的位错反应,导致了复杂的位错构型。如果在界面处的位错网络中存在不同方向的倾斜Burgers矢量或螺杆元件的不均匀分布,则可能出现脱毛层相对于衬底的轻微错位。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Misfit dislocations at ErAs/GaAs heterojunctions

Misfit dislocations at the ErAs/GaAs interfaces grown by molecular-beam epitaxy have been investigated using the weak-beam technique of transmission electron microscopy (TEM). The observed dislocation configurations are significantly different from those at heterojunctions between “diamond-cubic” structured materials. Networks of nearly orthogonal dislocation, with dislocations lying approximately along [010] and [001] dislocations, and honeycomb-like dislocation networks have been observed. The dislocation density increases as the ErAs layer thickness increases. Different dislocation reactions between the a/2〈110〉 type dislocations, which result in complex dislocation configurations, are discussed. Slight misalignment of the epilayer with respect to the substrate is possible if there are uneven distributions of inclined Burgers vectors in different orientations or screw components in the dislocation network at the interface.

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