温度对CuInS2薄膜光学性质的影响

A. S. Meshram, Y. D. Tembhurkar, O. Chimankar
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引用次数: 0

摘要

采用喷雾热解法制备了多晶CuInS2薄膜。利用氯化铜、三氯化铟和0.02 M硫脲的水溶液,在275℃至350℃的范围内改变衬底温度,将薄膜沉积在玻璃衬底上,这似乎是影响半导体物理性能的更重要参数。由于多晶CuInS2薄膜的光学性质与温度有关,晶界态在本质上是可操作的。通过光学测量,计算了吸收系数、消光系数、折射率和介电常数。在不同的衬底温度下制备的薄膜在t = 0.126 μm附近具有较高的透光率(76%),在t = 0.2163 μm附近具有较低的透光率(50%)。由于温度的变化,原子排列有规律,研究了CuInS2薄膜的化合物。由于薄膜不是故意掺杂的,所以在硫隙中观察到内在性质的缺陷。本研究最显著的结果是,温度随薄膜厚度的变化可以改变CuInS2薄膜的光学带隙、消光系数、折射率和介电常数的实虚部分。关键词:喷雾热解;CuInS2三元半导体;光学常数
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of temperature on optical properties of CuInS2 thin films
Polycrystalline CuInS2 thin films were grown by Spray pyrolysis method. This films have been deposited onto the glass substrate by varying substrate temperature from 275 0 C, at the interval of 25 to 350 0 C by using aqueous solution of Cupric chloride, Indium tri-chloride and thiourea of 0.02 M and Seems to be more important parameters affecting physical properties of the semiconductor. On account for the temperature dependent optical properties of polycrystalline CuInS2 thin films, grain boundary states were operative in nature. The values of absorption coefficient, extinction coefficient, refractive index, and dielectric constant have been calculated from the optical measurements. The prepared films at different substrate temperatures were found to have high transmittance (76 %) with the lowest thickness approximately t = 0.126 μm and at low transmittance (50 %) of the films with highest thickness nearly equal to t = 0.2163 μm. Due to temperature variation, the atoms are arrange regular in manner compound of CuInS2 films are investigates. As the films are not doped intentionally, defect observed in intrinsic nature by Sulphur interstitials. The most significant results in present study, the temperature varied with thickness of the film can be used to modify the optical band gap, extinction coefficient, refractive index and real-imaginary part of dielectric constants of CuInS2 thin films. KeywordsSpray pyrolysis, CuInS2 Ternary Semiconductor, Optical Constants
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