28nm金属电子熔断器编程电流的可靠性研究

Guangyan Zhao, Y. Zhao, W. Chien
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引用次数: 1

摘要

研究了不同编程电流下28nm金属电子保险丝的可靠性性能。高温应力(HTS)或温度循环(TC)会引起金属熔断器元件电阻和形状的变化。在本文中,我们发现低电流的28nm金属e-Fuse编程比高电流的28nm金属e-Fuse编程更稳定;电阻位移只在过度编程模式下的熔断器上观察到。此外,小电流下金属e-Fuse编程的SEM轮廓明显优于大电流下的SEM轮廓。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reliability investigations on the programming currents of 28nm metal e-Fuse
The reliability performance of 28nm metal e-Fuse programmed with different current is investigated. High temperature stress (HTS) or temperature cycling (TC) may cause the shift of metal-e-fuse element resistance and shape. In this paper, we find that 28nm metal e-Fuse programming with low current reliability performance is more stable than metal e-Fuse programming with high current; Resistance shift was only observed on fuses programmed in the over-programmed mode. In addition, the SEM profile of metal e-Fuse programming with low current is obviously better than high current SEM profile.
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