衬底温度对热蒸发制备ZrO2薄膜光学性能的影响

Ahmed H. Wanas
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引用次数: 0

摘要

在(2×10-5 bar)压力下,通过热蒸发将纯氧化锆(ZrO2)沉积在不同衬底温度下的玻璃衬底上,沉积速率为(0.5 nm/S),平均厚度为(300 nm)。所制备薄膜的光学性质随衬底温度的变化而集中。结果表明,随着衬底温度的升高,薄膜的折射率、堆积密度和消光系数均增大。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Substrate Temperature Effect on the Optical Properties of ZrO2 Films Prepared by Thermal Evaporation
The pure substance of Zirconium oxide  (ZrO2) was deposited on substrate of glass with various substrate temperatures using thermal evaporation under the pressure of (2×10-5 bar) and with a deposition rate of (0.5 nm/S) with an average thickness of (300 nm). The optical properties of these prepared films were concentrated as a function of the substrate temperature. It was found that the values ​​of each of the refractive index, packing density, together with the extinction coefficient increased with the increase in the substrate temperature of the prepared films.
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