反应磁控溅射的建模:不同建模方法的综述

IF 0.3 Q4 COMPUTER SCIENCE, THEORY & METHODS
R. Madarász, A. Kelemen, P. Kádár
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引用次数: 2

摘要

摘要:本文重点介绍了反应磁控溅射系统计算建模的现状。收集已开发模型的详细汇编,并根据正在建模的现象将其分组为类别。该调查涵盖了为分析磁控管放电,目标和衬底处粒子表面相互作用以及宏观模型而开发的模型。并给出了相应的在线软件包。在对研究现状有了必要的了解之后,给出了最具挑战性的任务清单,比较了用于克服遇到的困难的不同方法。与建模任务相关的挑战包括分析复杂性、用于模型逼近和简化的数学知识,以及计算负载和结果准确性之间的优化。作为结论,将未来的挑战汇编成一个列表,并给出了建模的可能方向,这可能是进一步追求的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Modeling reactive magnetron sputtering: a survey of different modeling approaches
Abstract The paper focuses on providing an insight into the current state of computational modeling regarding reactive magnetron sputtering systems. A detailed compilation of developed models is gathered and grouped into categories based on the phenomena being modeled. The survey covers models developed for the analysis of magnetron discharges, particle-surface interactions at the target and the substrate, as well as macroscopic models. Corresponding software packages available online are also presented. After gaining the necessary insight into the current state of research, a list of the most challenging tasks is given, comparing diffierent approaches, that have been used to combat the encountered difficulties. The challenges associated with modeling tasks range from analytical complexity, mathematical know-how used for model approximation and reduction, as well as optimization between computational load and result accuracy. As a conclusion, the future challenges are compiled into a list and a probable direction in modeling is given, that is likely to be further pursued.
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来源期刊
Acta Universitatis Sapientiae Informatica
Acta Universitatis Sapientiae Informatica COMPUTER SCIENCE, THEORY & METHODS-
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