光化学法沉积硫化铅薄膜的研究

T. Shyju, R. Gopalakrishnan
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引用次数: 1

摘要

采用光化学方法在玻璃和ITO镀膜玻璃衬底上制备了纳米硫化铅(PbS)薄膜。为了提高薄膜的粘附性和性能,采用光化学沉积的方法在ITO涂层基底上沉积薄膜。对沉积膜的结构、形态和电学性能进行了表征。光化学沉积的PbS薄膜具有四方体系。利用x射线衍射数据对沉积薄膜的位错密度进行了评价。沉积膜的高分辨率扫描电镜显示颗粒呈椭圆形排列。通过能量色散x射线分析确定了薄膜的元素组成。对薄膜进行了霍尔测量,并对其电学参数进行了评价。沉积的PbS膜具有正的霍尔系数,证实了p型电导率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Studies on lead sulphide thin films deposited by photochemical method
Nanocrystalline lead sulphide (PbS) thin films were deposited on glass and ITO coated glass substrates by photochemical method. To improve the adhesive nature and properties the films were deposited on ITO coated substrate using photochemical deposition. The deposited films were characterized to study their structural, morphological and electrical properties. The photochemically deposited PbS thin films possess tetragonal system. The dislocation densities of the deposited thin films were evaluated from the X-ray diffraction data. High Resolution Scanning Electron Micrographs of the deposited film shows the oval shape arrangement of particles. The elemental composition of the film was confirmed by Energy Dispersive X-ray analysis. Hall measurements were carried out for the films and their electrical parameters were evaluated. The as-deposited PbS films have positive Hall coefficient, which confirms p-type conductivity.
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