石墨烯的化学气相沉积:层控制、转移过程、表征和相关应用

IF 2.5 2区 化学 Q3 CHEMISTRY, PHYSICAL
Xiaohua Yang, Gaixia Zhang, J. Prakash, Zhangsen Chen, M. Gauthier, Shuhui Sun
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引用次数: 28

摘要

石墨烯是最有前途的二维(2D)纳米材料之一,在材料科学的几个领域得到了极大的关注。由于其独特的机械、电气、光学和热性能,石墨烯基材料引发了许多基础研究和技术应用。在几种合成方法中,化学气相沉积(CVD)已成为生产大面积高质量单晶石墨烯的最有前途的方法之一。本文介绍了CVD石墨烯的基本生长机制,以及在该过程中使用的各种参数和衬底。此外,还介绍了CVD合成单层和多层石墨烯的新进展,以及分析石墨烯精细结构和性能的先进技术。此外,还详细讨论了用于CVD石墨烯实际应用的转移工艺,重点介绍了其基本方面。本文对石墨烯的研究现状、发展前景和应用前景进行了展望。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Chemical vapour deposition of graphene: layer control, the transfer process, characterisation, and related applications
ABSTRACT Graphene, one of the most promising two-dimensional (2D) nanomaterials, has gained substantial attention in several areas of materials science. Due to its unique mechanical, electrical, optical, and thermal properties, graphene-based materials have triggered both numerous fundamental studies and technological applications. Out of several synthetic methods, chemical vapour deposition (CVD) has emerged as one of the most promising methods for the production of large areas of high quality single-crystal graphene. This review introduces the fundamental growth mechanisms of CVD graphene, alongside the various parameters and substrates employed in this process. Furthermore, new developments in the CVD synthesis of monolayer and few-layer graphene are presented, as well as advanced techniques for analysing the fine structure and properties of graphene. Moreover, a detailed discussion of the transfer processes used for practical applications of CVD graphene is provided, with emphasis on their fundamental aspects. This review concludes with an outlook on presently challenging issues, prospects and applications of graphene.
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来源期刊
CiteScore
14.20
自引率
1.60%
发文量
5
审稿时长
1 months
期刊介绍: International Reviews in Physical Chemistry publishes review articles describing frontier research areas in physical chemistry. Internationally renowned scientists describe their own research in the wider context of the field. The articles are of interest not only to specialists but also to those wishing to read general and authoritative accounts of recent developments in physical chemistry, chemical physics and theoretical chemistry. The journal appeals to research workers, lecturers and research students alike.
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