非晶Ni0.95Tb0.05和结晶镍的椭偏光谱分析

B.-Y. Yang, K. Vedam, P. Klosowski, J.S. Lannin
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引用次数: 1

摘要

采用椭偏光谱法测定了薄膜溅射结晶镍和浓非晶Ni0.95Tb0.05合金的赝介电常数。在晶系和非晶系中,表示矩阵元素加权态连接密度的ϵ2(ω)/λ的变化是相对相似的。这可以用这两种材料中相关的短程序和相似的d带态来解释。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Spectroscopic ellipsometry of amorphous Ni0.95Tb0.05 and crystalline nickel

Spectroscopic ellipsometry was used to determine the pseudodielectric constants of thin film sputtered crystalline nickel and the concentrated amorphous Ni0.95Tb0.05 alloy. The variation in ϵ2(ω)/λ, which indicates the matrix element weighted joint density of states, is found to be relatively similar for both crystalline and amorphous systems. This is interpreted in terms of related short-range order and similar d band states in both these materials.

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